Conference paper
Isotropic treatment of EMF effects in advanced photomasks
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
We consider conditions that have appeared in the literature with the purpose of defining a "good" decomposition of a relation scheme. We show that these notions are equivalent in the case that all constraints in the database are functional dependencies. This result solves an open problem of Rissanen. However, for arbitrary constraints the notions are shown to differ. © 1980.
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
F.M. Schellenberg, M. Levenson, et al.
BACUS Symposium on Photomask Technology and Management 1991
Juliann Opitz, Robert D. Allen, et al.
Microlithography 1998
Guo-Jun Qi, Charu Aggarwal, et al.
IEEE TPAMI