Acid-catalyzed dehydration for the design of chemical amplification resists

Abstract

Chemical amplification (3) based on radiation-induced acidolysis is a very attractive approach to dramatically increasing radiation sensitivities of resist systems for use in short wavelength lithographic technologies. Polarity reversal has been also utilized in the chemical amplification scheme. In this paper is reported another approach to achieving the reverse polarity change. The chemical amplification resists described in this paper are based on acid-catalyzed dehydration of alcohols to olefins.