A universal microsectioning technique for diffusion

Abstract

rf sputter etching has been successful tested for microsectioning and profiling of Au195 radioactive tracer self-diffusion into Au. It was possible to obtain sections of only 50 Å thickness in a reproducible manner and measure extremely small diffusion coefficients. The technique is expected to lend itself universally for diffusion microsectioning. © 1970 The American Institute of Physics.