Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
A simple and elegant set-theoretic characterization is given as to when a given set of functional and multivalued dependencies logically implies a given functional or multivalued dependency. A simple proof of the characterization is given which makes use of a result of Sagiv, Delobel, Parker, and Fagin (1981). © 1986.
Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
Leo Liberti, James Ostrowski
Journal of Global Optimization
Kaoutar El Maghraoui, Gokul Kandiraju, et al.
WOSP/SIPEW 2010
Thomas M. Cheng
IT Professional