High-speed split-emitter I2L/MTL memory cell
Siegfried K. Wiedmann, Denny D. Tang
ISSCC 1981
This paper describes a device profile design concept that reduces the junction field, and thus the high-field-induced leakage currents as well as the avalanche current. The insertion of an i-layer of thickness equal to the depletion-layer width of the original n + -p+ junction can lower the junction field by about a factor of 2. Computer studies show that using this design, the collector avalanche current can be reduced by more than one order, while compromising little in the switching speed of the transistor. © 1989 IEEE
Siegfried K. Wiedmann, Denny D. Tang
ISSCC 1981
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