Conference paper
Isotropic treatment of EMF effects in advanced photomasks
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
A note on maximizing a submodular set function subject to a knapsack constraint was presented. An (1-e-1)-approximation algorithm for maximizing a nondecreasing submodular set function was obtained. This algorithm required O(n5) function value computations. The algorithm enumerated all feasible solutions of cardinality one or two.
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
Heng Cao, Haifeng Xi, et al.
WSC 2003
A.R. Gourlay, G. Kaye, et al.
Proceedings of SPIE 1989
Ruixiong Tian, Zhe Xiang, et al.
Qinghua Daxue Xuebao/Journal of Tsinghua University