Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
Difference schemes that can be implemented through the fractional time step technique of Marchuk are amenable to an expedient which may be termed "a method of zero average phase error". The method involves a linear combination of forward and backward time steps. It is applied to a second-order approximation and compared with a fourth order approximation. There is a substantial reduction in dispersion. © 1968 Academic Press Inc.
Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
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ISIT 2005
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SPIE Photomask Technology + EUV Lithography 2009