Mark Lavin, Lars Liebmann
IEEE/ACM International Conference on Computer-Aided Design, Digest of Technical Papers
The major challenges of subresolution lithography, and modern double-patterning (DP) lithography solutions are reviewed. Hiding the complexity of DP from the designers leads to suboptimal design efficiency and overly constrains design options. Decomposition transparency through split-level design rules enables maximum design differentiation and allows designs to tailor DP-enhanced design methodologies to their specific needs. The review emphasizes that well-integrated DP-enhanced EDA solutions, such as DP-enhanced DRC, placement, routing, and extraction, preserve design efficiency. The IBM JDA design-technology cooptimization (DTCO) process provides a forum to identify high-leverage process challenges, such as same color metal spacing at the contacted poly pitch, that help reduce design impact of DP with well controlled process risk.
Mark Lavin, Lars Liebmann
IEEE/ACM International Conference on Computer-Aided Design, Digest of Technical Papers
Lars Liebmann, Jennifer Lund, et al.
Proceedings - Design Automation Conference
Maharaj Mukherjee, Scott Mansfield, et al.
SPIE Advanced Lithography 2005
Mark Lavin, Lars Liebmann
ICCAD 2002