PaperKinetic model for the chemical vapor deposition of tungsten in the silane reduction processJulian J. HsiehJournal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
PaperBrillouin scattering investigation of paraelectric KH2PO4 near the tricritical pointR.W. Gammon, E. Courtens, et al.Physical Review B
PaperGrowth instability in diffusion controlled polymerizationJ.H. Kaufman, Owen R. Melroy, et al.Synthetic Metals
Conference paperCoupling analysis of through-silicon via (TSV) arrays in silicon interposers for 3D systemsBiancun Xie, Madhavan Swaminathan, et al.EMC 2011
