Publications

This is our catalog of recent publications authored by IBM researchers, in collaboration with the global research community. We’re currently adding our back catalog of more than 110,000 publications. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.

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Year

6 results at SPIE Advanced Lithography 2019

Incorporating process variation contours in design rule calculation and SRAM design optimization
- - Dongbing Shao
  - Jing Sha
  - et al.
- 2019
- SPIE Advanced Lithography 2019
Engineering neural networks for improved defect detection and classification
- - Dhruv V. Patel
  - Ravi Bonam
  - et al.
- 2019
- SPIE Advanced Lithography 2019
Investigation of mask absorber induced image shift in EUV lithography
- - Martin Burkhardt
  - Anuja De Silva
  - et al.
- 2019
- SPIE Advanced Lithography 2019
Fundamentals of resist stochastics effect for single-expose EUV patterning
- - Anuja De Silva
  - Luciana Meli
  - et al.
- 2019
- SPIE Advanced Lithography 2019
EUV mask challenges and requirements for ultimate single exposure interconnects
- - Chris Progler
  - Michael Green
  - et al.
- 2019
- SPIE Advanced Lithography 2019
Analog memory-based techniques for accelerating the training of fully-connected deep neural networks
- - Sidney Tsai
  - Stefano Ambrogio
  - et al.
- 2019
- SPIE Advanced Lithography 2019