Methodology for trench capacitor etch optimization using voltage contrast inspection and special processingOliver D. PattersonXing J. Zhouet al.2010ASMC 2010
Voltage contrast test structure for measurement of mask misalignmentOliver D. PattersonRoland Hahnet al.2010ASMC 2010
Characterization of contact module failure mechanisms for SOI technology using E-beam inspection and in-line TEMXing J. ZhouOliver D. Pattersonet al.2010ASMC 2010