Coater/developer based techniques to improve high-resolution EUV patterning defectivity
- Koichi Hontake
- Lior Huli
- et al.
- 2017
- SPIE Photomask Technology + EUV Lithography 2017
Conference paper
Publications
2 results at SPIE Photomask Technology + EUV Lithography 2017
Development of amorphous silicon based EUV hardmasks through physical vapor deposition
- Anuja De Silva
- Yann Mignot
- et al.
- 2017
- SPIE Photomask Technology + EUV Lithography 2017
Conference paper