Preliminary evaluation of line edge roughness metrology based on CD-SAXS
- Ronald L. Jones
- Tengjiao Hu
- et al.
- 2004
- SPIE Advanced Lithography 2004
Publications
This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.
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5 results at SPIE Advanced Lithography 2004
Deep-UV immersion interferometric lithography
- Alex K. Raub
- A. Frauenglass
- et al.
- 2004
- SPIE Advanced Lithography 2004
Assessing the impact of intrinsic birefringence on 157nm lithography
- Nakgeuon Seong
- Kafai Lai
- et al.
- 2004
- SPIE Advanced Lithography 2004
Fast calculation of images for high numerical aperture lithography
- Alan E. Rosenbluth
- Gregg Gallatin
- et al.
- 2004
- SPIE Advanced Lithography 2004
A new approach to pattern metrology
- Christopher P. Ausschnitt
- 2004
- SPIE Advanced Lithography 2004