Optimizing Models Based OPC fragmentation using genetic algorithms
- Domenico A. Dipaola
- Ian Mobert
- 2008
- SPIE Photomask Technology + EUV Lithography 2008
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3 results at SPIE Photomask Technology + EUV Lithography 2008
Improvements in accuracy of dense OPC models
- Chidam Kallingal
- James Oberschmidt
- et al.
- 2008
- SPIE Photomask Technology + EUV Lithography 2008
Evaluation of 32nm Advanced immersion lithography pellicles
- N. Zhou
- K. Racette
- et al.
- 2008
- SPIE Photomask Technology + EUV Lithography 2008