Reducing line edge roughness in si and sin through plasma etch chemistry optimization for photonic waveguide applications
- Nathan Marchack
- Marwan Khater
- et al.
- 2017
- SPIE Advanced Lithography 2017
Conference paper
Publications
23 results at SPIE Advanced Lithography 2017
Printability and actinic AIMS review of programmed mask blank defects
- Erik Verduijn
- Pawitter Mangat
- et al.
- 2017
- SPIE Advanced Lithography 2017
Conference paperReaching for the true overlay in advanced nodes
- Chiew-Seng Koay
- Bassem Hamieh
- et al.
- 2017
- SPIE Advanced Lithography 2017
Conference paper