Improved reflectivity control of APEX-E positive tone deep-UV photoresist
- Willard Conley
- Ravindra Akkapeddi
- et al.
- 1994
- Microlithography 1994
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3489 results for Mathematical Sciences
0.25-μm lithography development using positive mode top surface imaging photoresist
- Douglas C. La Tulipe
- John P. Simons
- et al.
- 1994
- Microlithography 1994
Materials evaluation of antireflective coatings for single-layer 193-nm lithography
- Roderick R. Kunz
- Robert D. Allen
- 1994
- Microlithography 1994
(1) Recent developments in VUV femtosecond pulse generation; (2) proposal for a higher efficiency F2 (157-nm) laser
- J.H. Glownia
- D.R. Gnass
- et al.
- 1994
- SPIE OE/LASE 1994
Can hospitals afford digital storage for imagery?
- W.F. Cody
- H.M. Gladney
- et al.
- 1994
- SPIE Medical Imaging 1994
Optoelectronics technology consortium (OETC): Progress andplan
- David K. Lewis
- Philip J. Anthony
- et al.
- 1994
- SPIE OE/LASE 1994
Use of scatterometric latent image detector in closed loop feedback control of linewldth
- John Sturtevant
- Steve Holmes
- et al.
- 1994
- Microlithography 1994
Motion video analysis using planar parallax
- Harpreet S. Sawhney
- 1994
- IS&T/SPIE Electronic Imaging 1994
Retrieving images by 2D shape: A comparison of computation methods with human perceptual judgments
- Brian Scassellati
- Sophoclis Alexopoulos
- et al.
- 1994
- IS&T/SPIE Electronic Imaging 1994
Optimization of ESCAP photoresist for x-ray lithography
- A.T.S. Pomerene
- K.E. Petrillo
- et al.
- 1994
- Microlithography 1994