Lithographic qualification of new opaque MoSi binary mask blank for the 32-nm node and beyond
- Greg McIntyre
- Michael Hibbs
- et al.
- 2010
- J. Micro/Nanolithogr. MEMS MOEMS
This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. We’re currently adding our back catalog of more than 110,000 publications. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.