Publications

This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.

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3 results for R.J. Phaneuf

On the absence of post-plasma etch surface and line edge roughness in vinylpyridine resists
- - R. Bruce
  - Florian Weilnboeck
  - et al.
- 2011
- Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics
Molecular structure effects on dry etching behavior of Si-containing resists in oxygen plasma
- - R. Bruce
  - T. Lin
  - et al.
- 2010
- Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics
Dependence of photoresist surface modifications during plasma-based pattern transfer on choice of feedgas composition: Comparison of C₄ F ₈ - And CF₄ -based discharges
- - S. Engelmann
  - R. Bruce
  - et al.
- 2009
- Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics