On the absence of post-plasma etch surface and line edge roughness in vinylpyridine resists
- R. Bruce
- Florian Weilnboeck
- et al.
- 2011
- Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics
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2 results for T. Lin
Molecular structure effects on dry etching behavior of Si-containing resists in oxygen plasma
- R. Bruce
- T. Lin
- et al.
- 2010
- Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics