Characterization and optimization of charge trapping in high-k dielectrics
- Eduard Cartier
- Takashi Ando
- et al.
- 2013
- IRPS 2013
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Modeling and characterization of gate leakage in high-K metal gate technology-Based embedded DRAM
- Mohit Bajaj
- Rajan K. Pandey
- et al.
- 2013
- IEEE T-ED