Experimental result and simulation analysis for the use of pixelated illumination from source mask optimization for 22nm logic lithography process
- Kafai Lai
- Alan E. Rosenbluth
- et al.
- 2009
- SPIE Advanced Lithography 2009
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29 results for Alfred Wagner
Evaluation of 32nm Advanced immersion lithography pellicles
- N. Zhou
- K. Racette
- et al.
- 2008
- SPIE Photomask Technology + EUV Lithography 2008
Femtosecond laser ablation and deposition of metal films on transparent substrates with applications in photomask repair
- Richard Haight
- Alfred Wagner
- et al.
- 2005
- Lasers and Applications in Science and Engineering 2005
High Resolution Material Processing with Femtosecond Lasers: Mask Repair and Beyond
- Richard Haight
- Alfred Wagner
- et al.
- 2003
- FiO 2003
MARS2: An advanced femtosecond laser mask repair tool
- Alfred Wagner
- Richard Haight
- et al.
- 2002
- SPIE Photomask Technology 2002
Implementation and performance of a femtosecond laser mask repair system in manufacturing
- R. Haight
- Dennis Hayden
- et al.
- 1998
- BACUS Symposium on Photomask Technology and Management 1998
Process latitude study of focused ion-beam-deposited gold for clear x-ray mask repair
- Patricia G. Blauner
- Andrew D. Dubner
- et al.
- 1993
- Microlithography 1993
Model for focused ion beam deposition
- J.P. Levin
- P.G. Blauner
- et al.
- 1990
- Microlithography 1990
Mitigation of extreme ultraviolet mask defects by pattern shifting: Method and statistics
- Alfred Wagner
- Martin Burkhardt
- et al.
- 2012
- Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics
Lithographic qualification of new opaque MoSi binary mask blank for the 32-nm node and beyond
- Greg McIntyre
- Michael Hibbs
- et al.
- 2010
- J. Micro/Nanolithogr. MEMS MOEMS