Backside power distribution for nanosheet technologies beyond 2nm
- Ruilong Xie
- Wonhyuk Hong
- et al.
- 2024
- VLSI Technology and Circuits 2024
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Wet clean oxidation for optimal line width and LER
- Steven McDermott
- Keith Donegan
- et al.
- 2025
- SPIE Advanced Lithography + Patterning 2025