Future of plasma etching for microelectronics: Challenges and opportunities
- Gottlieb S. Oehrlein
- Stephan M. Brandstadter
- et al.
- 2024
- Journal of Vacuum Science and Technology B
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7 results for Jane P. Chang
In-situ etch rate study of HfxLayOz in Cl2/BCl3 plasmas using the quartz crystal microbalance
- Nathan Marchack
- Taeseung Kim
- et al.
- 2015
- JVSTA
Feature profile evolution during shallow trench isolation etching in chlorine-based plasmas. III. the effect of oxygen addition
- Cheng-Che Hsu
- Nathan Marchack
- et al.
- 2013
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Structural properties of epitaxial SrHfO3 thin films on Si (001)
- Monica Sawkar-Mathur
- Chiara Marchiori
- et al.
- 2010
- Thin Solid Films
Plasma etching of Hf-based high- k thin films. Part III. Modeling the reaction mechanisms
- Ryan M. Martin
- Jane P. Chang
- 2009
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Plasma etching of Hf-based high- k thin films. Part II. Ion-enhanced surface reaction mechanisms
- Ryan M. Martin
- Hans-Olof Blom
- et al.
- 2009
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Plasma etching of Hf-based high- k thin films. Part I. Effect of complex ions and radicals on the surface reactions
- Ryan M. Martin
- Jane P. Chang
- 2009
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films