Publications

3 results for William J. Durand

High chi block copolymer DSA to improve pattern quality for FinFET device fabrication
- - Hsinyu Tsai
  - Hiroyuki Miyazoe
  - et al.
- 2016
- SPIE Advanced Lithography 2016
Interfacial layers with photoswitching surface energy for block copolymer alignment and directed self-assembly
- - Michael J. Maher
  - Christopher M. Bates
  - et al.
- 2015
- J. Photopolym. Sci. Tech.
Directed self-assembly of silicon-containing block copolymer thin films
- - Michael J. Maher
  - Charles T. Rettner
  - et al.
- 2015
- ACS AMI