Electron beam generated plasmas: Characteristics and etching of silicon nitride
- S. G. Walton
- D. R. Boris
- et al.
- 2017
- Microelectronic Engineering
Publications
This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.
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2 results for E.H. Lock
Initial evaluation and comparison of plasma damage to atomic layer carbon materials using conventional and low Te plasma sources
- Ashish Jagtiani
- Hiroyuki Miyazoe
- et al.
- 2016
- JVSTA