Lithographic qualification of new opaque MoSi binary mask blank for the 32-nm node and beyond
- Greg McIntyre
- Michael Hibbs
- et al.
- 2010
- J. Micro/Nanolithogr. MEMS MOEMS
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Critical impact of mask electromagnetic effects on optical proximity corrections performance for 45 nm and beyond
- Jaione Tirapu Azpiroz
- Alan E. Rosenbluth
- et al.
- 2007
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures