REACTIVE ION ETCHING OF Al(Cu) ALLOYS.
- C.-K. Hu
- M.B. Small
- et al.
- 1986
- MRS Fall Meeting 1986
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2 results for M. Schadt
Two-level metal fully planarized interconnect structure implemented on a 64 kb CMOS SRAM
- D. Moy
- M. Schadt
- et al.
- 1989
- VMIC 1989