Future of plasma etching for microelectronics: Challenges and opportunities
- Gottlieb S. Oehrlein
- Stephan M. Brandstadter
- et al.
- 2024
- Journal of Vacuum Science and Technology B
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2 results for Kenji Ishikawa
Rethinking surface reactions in nanoscale dry processes toward atomic precision and beyond: A physics and chemistry perspective
- Kenji Ishikawa
- Tatsuo Ishijima
- et al.
- 2019
- Japanese Journal of Applied Physics