An acid-based electroless Cu deposition process: Chemical formulation, film characteristics and CMP performance
- Wei-Tsu Tseng
- Chia-Hsien Lo
- et al.
- 2000
- ECS Meeting 2000
This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.