Kinetic model for the chemical vapor deposition of tungsten in the silane reduction process
- Julian J. Hsieh
- 1993
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
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Influence of surface-activated reaction kinetics on low-pressure chemical vapor deposition conformality over micro features
- Julian J. Hsieh
- 1993
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films