Resist materials design: Base-catalyzed chemical amplification
- C.G. Wilison
- J.F. Cameron
- et al.
- 1993
- Microlithography 1993
Publications
This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.
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4 results for Man-Kit Leung
Recent advances in chemically amplified resist materials
- C.G. Willson
- J.F. Cameron
- et al.
- 1992
- ACS PMSE 1992
Photogenerated Base in Resist and Imaging Materials: Design of Functional Polymers Susceptible to Base Catalyzed Decarboxylation
- Jean M. J. Fréchet
- Man-Kit Leung
- et al.
- 1997
- Chemistry of Materials
Design and Synthesis of Photoactive Polymer Systems Based on Amine-Catalyzed Intramolecular Imidization of Polymer Side Chains
- Man-Kit Leung
- Jean M. J. Fréchet
- et al.
- 1995
- Macromolecules