High yielding self-aligned contact-process for a 0.150-μm DRAM technology
- Thomas S. Rupp
- David Dobuzinsky
- et al.
- 2002
- IEEE Trans Semicond Manuf
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2 results for Hang-Yip Liu
Advanced lithography kits: Serifs and hammerhead
- Hang-Yip Liu
- Steffen Schulze
- et al.
- 2000
- Proceedings of SPIE - The International Society for Optical Engineering