Skip to main content

Focus areas

Artificial Intelligence

Quantum Computing

About

Artificial Intelligence

Quantum Computing

Focus areas
Blog
Publications
Careers
About

Publications

Home
Publications

Filter by

1 result for Aleksandra Clancy

Line edge roughness reduction by plasma curing photoresists
- - Arpan P. Mahorowala
  - Kuang-Jung Chen
  - et al.
- 2005
- Microlithography 2005

Date

Start

End

Featured collections

Popular topics

Focus areas
Quick links
Work with us
- Careers
- Contact Research
Directories
Follow us

Contact IBM
Privacy
Terms of use
Accessibility