Electrical validation of the integration of 193i and DSA for sub-20nm metal cut patterningChi Chun LiuRichard Farrellet al.2019MEMS/NEMS/MOEMS 2019
The integration of 193i and DSA for BEOL metal cuts/blocks targeting sub-20nm tip-to-tip CDChi-Chun LiuYann Mignotet al.2018SPIE Advanced Lithography 2018