A solid-state 193 nm laser with high spatial coherence for sub-40 nm interferometric immersion lithography
- Andrew J. Merriam
- Donald S. Bethune
- et al.
- 2007
- SPIE Advanced Lithography 2007
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Efficient nonlinear frequency conversion to 193-nm using cooled BBO
- Andrew J. Merriam
- James J. Jacob
- et al.
- 2007
- ASSP 2007