Global optimization of masks, including film stack design to restore TM contrast in high NA TCC's
- Alan E. Rosenbluth
- David Melville
- et al.
- 2007
- SPIE Advanced Lithography 2007
Publications
9 results for Nakgeuon Seong
Global optimization of the illumination distribution to maximize integrated process window
- Alan E. Rosenbluth
- Nakgeuon Seong
- 2006
- SPIE Advanced Lithography 2006
Topics in polarization ray tracing for image projectors
- Alan E. Rosenbluth
- Gregg Gallatin
- et al.
- 2005
- SPIE Optics + Photonics 2005
Integrating DfM components into a cohesive design-to-silicon solution
- Lars Liebmann
- Dan Maynard
- et al.
- 2005
- Microlithography 2005
Immersion lithography: New opportunities for semiconductor manufacturing
- Darío Gil
- Timothy A. Brunner
- et al.
- 2004
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Fast calculation of images for high numerical aperture lithography
- Alan E. Rosenbluth
- Gregg Gallatin
- et al.
- 2004
- SPIE Advanced Lithography 2004
Assessing the impact of intrinsic birefringence on 157nm lithography
- Nakgeuon Seong
- Kafai Lai
- et al.
- 2004
- SPIE Advanced Lithography 2004
High numerical aperture lithographic imagery at the Brewster angle
- Timothy A. Brunner
- Nakgeuon Seong
- et al.
- 2002
- Journal of Microlithography, Microfabrication and Microsystems
High NA lithographic imagery at Brewster's angle
- Timothy A. Brunner
- Nakgeuon Seong
- et al.
- 2002
- Proceedings of SPIE - The International Society for Optical Engineering