Sidewall damage in plasma etching of Si/SiGe heterostructures
- R. Ding
- L.J. Klein
- et al.
- 2009
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
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2 results for A.E. Wendt
Fluorocarbon high density plasmas. VIII. Study of the ion flux composition at the substrate in electron cyclotron resonance etching processes using fluorocarbon gases
- Gottlieb S. Oehrlein
- Ying Zhang
- 1994
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films