Cr migration on 193nm binary photomasks
- John Bruley
- Geoffrey Burr
- et al.
- 2009
- SPIE Advanced Lithography 2009
Publications
This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.
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2 results for Andrew Watts
Early mask results of KRS-XE and current progress in improving sensitivity and etch resistance
- Christina Deverich
- Andrew Watts
- et al.
- 2002
- Photomask and Next-Generation Lithography Mask Technology 2002