Improved reflectivity control of APEX-E positive tone deep-UV photoresist
- Willard Conley
- Ravindra Akkapeddi
- et al.
- 1994
- Microlithography 1994
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4 results for J. Fahey
Novel chemically amplified dry-developing imaging materials for high resolution microlithography
- J.M.J. Frchet
- J. Fahey
- et al.
- 1992
- J. Photopolym. Sci. Tech.
Chemically amplified resists based on polymer side‐chain rearrangement or electrophilic crosslinking
- J.M.J. Fréchet
- S. Matuszczak
- et al.
- 2004
- Polymer Engineering & Science
Resist system based on the cationic photocrosslinking of poly(4‐hydroxystyrene) and polyfunctional electrophiles
- J. Fahey
- K. Shimizu
- et al.
- 1993
- Journal of Polymer Science Part A: Polymer Chemistry