Publications

This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.

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4 results for J. Fahey

Improved reflectivity control of APEX-E positive tone deep-UV photoresist
- - Willard Conley
  - Ravindra Akkapeddi
  - et al.
- 1994
- Microlithography 1994
Novel chemically amplified dry-developing imaging materials for high resolution microlithography
- - J.M.J. Frchet
  - J. Fahey
  - et al.
- 1992
- J. Photopolym. Sci. Tech.
Chemically amplified resists based on polymer side‐chain rearrangement or electrophilic crosslinking
- - J.M.J. Fréchet
  - S. Matuszczak
  - et al.
- 2004
- Polymer Engineering & Science
Resist system based on the cationic photocrosslinking of poly(4‐hydroxystyrene) and polyfunctional electrophiles
- - J. Fahey
  - K. Shimizu
  - et al.
- 1993
- Journal of Polymer Science Part A: Polymer Chemistry