Impact of thin resist processes on post-etch LER
- Arpan P. Mahorowala
- Dario L. Goldfarb
- et al.
- 2003
- Microlithography 2003
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7 results for H.H. Sawin
Mechanisms and models of Si film growth from SiH4 and Si2H6
- S. Gates
- S.K. Kulkarni
- et al.
- 1990
- Symposium on Process Physics and Modeling in Semiconductor Technology 1990
Effect of thin-film imaging on line edge roughness transfer to underlayers during etch processes
- Dario L. Goldfarb
- Arpan P. Mahorowala
- et al.
- 2004
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
The Gaseous Electronics Conference radio-frequency reference cell: A defined parallel-plate radio-frequency system for experimental and theoretical studies of plasma-processing discharges
- P.J. Hargis Jr.
- K.E. Greenberg
- et al.
- 1994
- Review of Scientific Instruments
Simulation of surface topography evolution during plasma etching by the method of characteristics
- Manoj Dalvie
- Satoshi Hamaguchi
- 1994
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Surface reactions in Si chemical vapor deposition from silane
- S.K. Kuikarni
- H.H. Sawin
- 1990
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Kinetics and mechanics of Si2H6 surface decomposition on Si
- C.M. Greenlief
- H.H. Sawin
- 1990
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films