Effects of substrate bias frequency in an electron cyclotron resonance plasma reactor
- W.M. Holber
- 1993
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Publications
4 results for D.J. Hoffman
A fluid description for the discharge equilibrium of a divergent electron cyclotron resonance plasma source
- G. Guan
- M.E. Mauel
- et al.
- 1992
- Physics of Fluids B
The effects of substrate bias on plasma parameters in an electron cyclotron resonance plasma reactor
- John B.O. Caughman
- William M. Holber
- 1991
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Ion energy measurements at the surface of an ion cyclotron range of frequencies antenna faraday shield
- D.J. Hoffman
- R.A. Langley
- et al.
- 1990
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films