Formation of c54 tisi2: Effects of niobium additions on the apparent activation energy
- F.M. D’Heurle
- S.-L. Zhang
- et al.
- 2001
- Journal of Applied Physics
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4 results for F.M. Dheurle
Interface stability of Ti(SiG and SiGe alloys: Tie lines in the ternary equilibrium diagram
- D. Aldrich
- F. d’Heurle
- 1996
- Physical Review B - CMMP
Metallurgical topics in silicon device interconnections: Thin film stresses
- F.M. D’Heurle
- 1989
- International Materials Reviews
Boron, phosphorus, and arsenic diffusion in tisi2
- P. Gas
- V.R. Deline
- et al.
- 1986
- Journal of Applied Physics