Carbon-13 Relaxation Study of Stereoregular Poly(methyl methacrylate) in Solution
- J.R. Lyerla
- T.T. Horikawa
- et al.
- 2002
- JACS
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Parameters, affecting the sensitivity of poly(methyl methacrylate) as a positive lithographic resist
- Edward Gipstein
- Augustus C. Ouano
- et al.
- 2004
- Polymer Engineering & Science
Compositional Analyses of Methyl Methacrylate-Methacrylic Acid Copolymers by Carbon-13 Nuclear Magnetic Resonance Spectrometry
- Duane E. Johnson
- James R. Lyerla
- et al.
- 1977
- Analytical Chemistry