PaperNucleation and growth in the reaction of titanium with germanium and some silicon-germanium alloysO. Thomas, F.M. D'Heurle, et al.Applied Surface Science
PaperDiffusion of boron, phosphorus, and arsenic implanted in thin films of cobalt disilicideO. Thomas, P. Gas, et al.Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
PaperRedistribution of As during Pd2Si formation: Electrical measurementsM. Wittmer, C.-Y. Ting, et al.Journal of Applied Physics
PaperInvestigation of Tin films reactively sputtered using a sputter gunK.Y. Ahn, M. Wittmer, et al.Thin Solid Films
