A. Nagarajan, S. Mukherjee, et al.
Journal of Applied Mechanics, Transactions ASME
Paper
Ultraviolet-photoemission studies of formic acid decomposition on ZnO nonpolar surfaces
Abstract
Ultraviolet photoemission studies of HCOOH decomposition on ZnO (1100) at 120 and 300 K show that the reaction products remaining on the surface include CO and atomic O. Both the 5 σ (lone-pair) and 1 π orbitals of CO show chemical bonding shifts due to adsorption; this multiple-bonding behavior contrasts that observed on transition metal surfaces and apparently reflects special properties of the ZnO semi-conductor surface. © 1976.
Related
A. Gupta, R. Gross, et al.
SPIE Advances in Semiconductors and Superconductors 1990
Paper
The DX centre
T.N. Morgan
Semiconductor Science and Technology
J.H. Kaufman, Owen R. Melroy, et al.
Synthetic Metals