Tracer diffusion in amorphous Pd₈₀Si₂₀ and Gd₁₆Co₈₄ films

Abstract

Evaporated Pd80Si20 and sputtered Gd16Co84 amorphous films were studied for structural relaxation during annealing with a Seeman-Bohlin X-ray diffractometer and for atomic diffusion using radioactive Au195 and Co57 tracers. The diffusion parameters for these two kinds of films with pre-annealing are presented. © 1982.