Chemically amplified resists: Past, present, and future
Hiroshi Ito
SPIE Advances in Resist Technology and Processing 1999
A report is presented on the thermal decomposition behavior of several polymethacrylates and the effect of the ester structure on the thermolysis in correlation with the photosensitivity in acid-catalyzed thermolysis. Differential scanning calorimetry (DSC) curves of the polymethacrylates and presented together with that of PMAA Polymethacrylic Acid PMAA loses absorbed water below 140°C (1st heating), and then dehydrates to form PMAN, at the temperature ranging from 180 to 260°C.
Hiroshi Ito
SPIE Advances in Resist Technology and Processing 1999
Hiroshi Ito
ACS Division of Polymer Chemistry Washington DC Meeting 1990
Hiroshi Ito, G.M. Wallraff, et al.
International Conference on Microprocesses and Nanotechnology 2001
Hiroshi Ito, Arno Knebelkamp, et al.
ACS PMSE 1992