Masanori Murakami, E.I. Alessandrini, et al.
Journal of Applied Physics
Changes in the microstructure of ε-phase Pb-Bi films with various thicknesses that were deposited onto oxidized Si substrates and then repeatedly thermally cycled between 298 and 4.2 K were studied using x-ray diffraction, transmission, and scanning electron microscopy. The level of strain supported elastically by the films had a strong dependence on the film thickness. For 0.2-μm-thick films, almost all of the strain was supported elastically. For 1.0-μm-thick films most of the strain was relaxed upon cooling to 4.2 K, and grain rotation, hillock formation, and dislocation slip steps were observed after repeated cycling. For 0.4-μm-thick films in which about 0.1% of the strain was relaxed upon cooling to 4.2 K, such changes in the microstructure were observed after ∼200 cycles. Although these changes were significantly suppressed by 0.6-μm-thick SiO layers coated onto the films, the grain rotation and hillock formation were observed after 400 cycles for SiO-coated, 0.4-μm-thick films similar to those used for the counter electrodes of Pb-alloy Josephson junctions.
Masanori Murakami, E.I. Alessandrini, et al.
Journal of Applied Physics
Masanori Murakami, Carlos M. Serrano
Journal of Applied Physics
J.H. Basson, Masanori Murakami, et al.
Journal of Applied Physics
J.H. Basson, Masanori Murakami, et al.
Journal of Applied Physics