Conference paper
Isotropic treatment of EMF effects in advanced photomasks
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
No abstract available.
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
Zhihua Xiong, Yixin Xu, et al.
International Journal of Modelling, Identification and Control
Sankar Basu
Journal of the Franklin Institute
M. Shub, B. Weiss
Ergodic Theory and Dynamical Systems