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Photomask and Next-Generation Lithography Mask Technology 2004
The expressive power of the data flow schemes of Dennis is evaluated. It is shown that data flow schemes have the power to express an arbitrary determinate functional. The proof involves a demonstration that “restricted data flow schemes” can simulate Turing Machines. This provides a new. simple basis for computability. © 1980, All rights reserved.
Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
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